Laboratory for Conductor Surface Spectroscopy

• (Head of the Laboratory Prof. V.S. Tsoi).

• There is the natural limit towards the miniaturization of transistors - the electron wave length. Namely such reason results in technological substitution photolithography with electron-, x-ray, etc. lithographies operating with much shorter wavelengths. Direction for the development of innovative future devices is defined by decreasing of electron wavelength. This means that the semiconductor devices must be replaced with metal devices. It is obvious that such devices have to work in the wave electron optic regime. In this case, not only electron path length, but also quenched magnetic flux determine the electron wave phase shift. The scattering of conduction electrons at interfaces, including sample surfaces, will determine the qualities of the devices. Namely fundamental and applied investigations arising from the principals formulated above determine the main goal of our laboratory. Research projects of the laboratory deal with: i. electron wave optic; ii. atomic structure of interfaces; iii. kinetics of highly non- equilibrium electrons; iv. giant magnetoresistance in mesoscopic magnetic multilayers.
  
  

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• Staff of the lab

• Abstracts of articles published this year