Laboratory of semiconductor surfaces spectroscopy


The basic experimental equipment of the laboratory includes electron spectrometers and scanning probe microscopes for surface analysis as well as accompanying facilities for sample preparation. Among the LSSS devices the following can be mentioned: ultra high vacuum electron spectrometer ESCALAB-5 (low energy electron diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy, electron energy loss spectroscopy techniques with facilities for spectroscopic measurements at low temperatures down to 10K); electron spectrometer RIBER LAS-3000 equipped with room temperature STM GPI-300 (low energy electron diffraction, Auger electron spectroscopy, scanning tunneling microscopy with atomic resolution on metal and semiconductor surfaces); high vacuum scanning probe complex based on SPM Solver HV (NT-MDT, Zelenograd); atomic force and scanning tunneling microscopes including combined low temperature (4.2K) microscope with STM and SNOM techniques; cryostats for high magnetic field measurements (up to 912T); High vacuum chambers with facilities for thin film deposition and sample annealing.

UHV electron spectrometers ESCALAB-5 (AES, XPS, UPS, EELS) and LAS-3000 (LEED, AES) with scanning head of RT STM GPI-300

UHV electron spectrometers Microlab MK-II and ESCALAB with low temperature STM

Copyright ISSP RAS, LSSS, 2006-2007
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